FISCHERSCOPE X-RAY XDV-µ
Smallest measuring spot, highest precision: for very small, flat components and multilayer systems.
Learn moreFISCHERSCOPE X-RAY XDV-µ WAFER
Specialised solution for automated measurement of thin films and multilayer systems on 6–12 inch wafers.
FISCHERSCOPE X-RAY XDV-µ WAFER
The XDV-µ WAFER is designed for automated measurement of thin films and multilayer systems on wafers from 6 to 12 inches in diameter. Automatic image recognition enables reliable measurement of small structures.
Key features
- In-house polycapillary optics: Fischer is the only XRF manufacturer producing its own polycapillary lenses
- DPP+ signal processing: up to 50 % better repeatability or significantly shorter measuring times
- Automatic image recognition for reliable measurement of small structures
Technical data
- Measuring spot
- From 10 µm (FWHM)
- Optics
- Polycapillary: 10 µm halo-free, 17 µm halo-free or 17 µm halo
- Application
- 6–12 inch wafers
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